LC-A0 High Purity Coconut Shell Carbon – Semiconductor Grade Ultra-Pure Water

Key Features

• Iodine value 1000–1500 mg/g

  Highly developed microporosity delivers high removal efficiency for trace organics and free chlorine.

• Acid-washed purification process, ash <3%

  Produces extremely low soluble metal leaching, avoiding contamination of ultra-pure water streams.

• Hardness >95%

  Resists breakage and dust generation during backwashing, reducing downstream particulate risk.

• TOC contribution <50 ppb in effluent

  Meets the strict inlet requirements of high-end ultra-pure water systems.

• Available in multiple mesh sizes

  Compatible with pre-treatment tanks, polishing columns and other equipment types.

Applications

• Semiconductor Fab UPW Systems: Advanced wafer manufacturing requires water with ppb-level organic and metal contamination control. LC-A0's multi-stage acid washing reduces extractable metals and ash to semiconductor-grade specifications, preventing conductivity spikes and protecting sensitive lithography and cleaning processes.

• Industrial Water Reuse & Recycling: Water reclamation and reuse systems demand strict control of residual organics and trace impurities to meet recycling quality standards. LC-A0's ultra-low leachables and stable adsorption performance ensure consistent effluent quality without introducing secondary contaminants in closed-loop water systems.

• Power Plant Condensate Polishing: Condensate return systems in thermal and nuclear power plants require removal of trace organics and corrosion products. LC-A0's acid-washed purity prevents boiler tube contamination and maintains turbine efficiency.

• High-End Electronic Electroplating: Electroplating solutions are highly sensitive to organic impurities and metallic contamination. LC-A0 removes organic decomposition products without leaching metals that would degrade deposit quality.

Technical Advantages

• Reduces extractables by over 70% compared to standard food-grade coconut shell carbon, releasing no impurities into the water stream.

• Pore structure optimized for small-molecule organics delivers more thorough removal of trace TOC in ultra-pure water.

• Rinsed with pure water during final production stages with no residual chloride as shipped, avoiding impact on sensitive processes.

• Excellent batch-to-batch purity consistency with metal leaching test reports available for every production batch.

Certifications

PURESTAR adheres to strict quality control and international certification standards. Our authentic certifications include:

• ISO 9001: Quality Management System

• ISO 14001: Environmental Management System

• ISO 45001: Occupational Health & Safety Management System

• NSF: Certified for drinking water safety & sanitation

• HALAL: Certified for food-contact applications

Quality Assurance

• MSDS (Material Safety Data Sheet) available upon request

• COA (Certificate of Analysis) provided with every shipment

All products undergo strict quality inspection to deliver stable, reliable performance for global customers.

Why Choose Us

• 10+ years of experience in activated carbon manufacturing and export

• Stable production capacity ensuring reliable supply for bulk orders

• Strict quality control system from raw material to final product

• Customized solutions based on different industrial applications

• Fast response within 12–24 hours for all inquiries

• Professional technical support for product selection and application guidance

FAQ

Q: What is the difference between LC-A0 and PSD-A0 S for ultra-pure water?

A: LC-A0 is positioned as high-end semiconductor grade with deeper acid washing purification and stricter metal leaching control, intended for the most demanding UPW polishing stages. PSD-A0 S is a general acid-washed grade suitable for drinking water and standard UPW pre-treatment, offering better cost efficiency.

Q: What pre-treatment is required before loading?

A: We recommend forward and backwashing with ultra-pure water until effluent resistivity and TOC stabilize before putting online. Avoid contact with carbon steel equipment during loading to prevent iron ion contamination. For less critical systems, PSD-A0 S requires less intensive pre-rinsing.

Q: In UPW systems, should LC-A0 be placed before or after RO?

A: It is most commonly placed before RO to remove free chlorine and protect membranes. For deep TOC control, an additional polishing carbon bed can be added after RO and before the mixed bed. For pre-RO protection only, GAC-P S may be sufficient.